Preferred Label : resist polymer;
IUPAC definition : Polymeric material that, when irradiated, undergoes a marked change in solubility
in a given solvent or is ablated.;
Scope note : in a positive-tone resist, also called a positive resist, the material in the irradiated
area not covered by a mask is removed, which results in an image with a pattern identical
with that on the mask. in a negative-tone resist, also called a negative resist, the
non-irradiated area is subsequently removed, which results in an image with a pattern
that is the complement of that on the mask.; a resist material that is optimized for use with ultraviolet or visible light, an
electron beam, an ion beam, or x-rays is called a photoresist, electron-beam resist,
ion-beam resist, or x-ray resist, respectively.; a resist polymer under irradiation either forms patterns directly or undergoes chemical
reactions leading to pattern formation after subsequent processing.;
Origin ID : RT07193;
See also
Polymeric material that, when irradiated, undergoes a marked change in solubility
in a given solvent or is ablated.
