Preferred Label : photoresist;
IUPAC definition : A photoimaging material, generally applied as a thin film, whose local solubility
properties can be altered photochemically. A subsequent development step produces
an image which is useful for the fabrication of microelectronic devices (e.g. integrated
circuits).;
Origin ID : P04651;
See also
A photoimaging material, generally applied as a thin film, whose local solubility
properties can be altered photochemically. A subsequent development step produces
an image which is useful for the fabrication of microelectronic devices (e.g. integrated
circuits).
