Preferred Label : poly(4-hydroxystyrene-co-2-ethyl-2-adamantyl methacrylate-co-phenyl methacrylate dimethylsulfonium
nonaflate);
MeSH note : an EUV resist; structure in first source;
MeSH synonym : poly(HOST-co-EAMA-co-PAG);
Is substance : O;
Origin ID : C505215;
UMLS CUI : C1620281;
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